The direct LIG process: in 4 steps to a precise Micro Gear
Lithographic processes pave the way for production of significantly smaller structures and modules, while allowing increased complexity and functionality of micro components. Micromotion employs deep X-ray lithography followed by alloy electroplating (LIGA) to create very strong, highly precise micro components and micro gears.
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Exposure
Gear structures are located in the absorber layer of a mask. These are very precisely transferred by shadow projection into a photoresist. |
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Development
High energy, shortwave and highly parallel synchronous radiation is used to transfer the structures into the photoresist up to a millimetre or more in height with deviations of less than 1 µm. The subsequent development process produces a three-dimensional negative mould. |
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Galvanic moulding
The moulds for the gear structures are then galvanic-moulded with nickel/iron electrolytes. This produces gears made of high-strength metal that are corrosion resistant, autoclavable and can be used over a broad temperature range as well as in ultra high vacuum. |
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Components
After the gears are galvanic moulded, the tooth width of the gears is adjusted by lapping the wafer. Thereafter, the silicon wafer and photo-resist are removed and the result are the individual gears. |
